Issue and Challenges Facing Sputtering of ITO thin films

Golshahi, Siamak (2019) Issue and Challenges Facing Sputtering of ITO thin films. In: 1st International Conference on Optoelectronics, Applied Optics and Microelectronics - 2019.

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Abstract

Structures of optoelectronic devices are composed of at least a transparent conductive Oxide (TCO) films. TCO materials benefit from both the high electrical conductivity and Optical transparency in visible spectra region which have made them transparent electrodes. It is more than four decades that Indium Tin Oxide (ITO) has been known as the most versatile TCO. Among the deposition techniques carried out to fabricate ITO thin films, Sputtering has carved a niche in both research and Industry all due to its reproducibility. Though numerous numbers of publications already revealed the details of ITO deposition from the physical, chemical and material point of view, still issues and challenges have remained for researchers intended to push the borders in this field of research. A few numbers of these sophistications which I faced while sputtering ITO thin films are explained and solutions also are proposed. A DST3 desktop sputter coater (Nanostructure Coating Co.) is employed to fabricate thin films. A circular 2-inch ITO (Rearth Technology Co.) with purity of 99.99% is also used as the target. The age of target is an influential parameter that will affect the ratio of Tin Oxide (SnO2) to Indium Oxide (In2O3) due to the lower melting point of SnO2 respect to In2O3. To overcome this issue pre-sputtering has to be carried out to remove an ultra-thin Sn deficient ITO layer. It is reasonable to expect erosion in aged target. Erosion directly affects the uniformity of deposited ITO films. To solve this problem, deposition can be undertaken using a RF power supply which give rise to more uniform thin films in comparison to DC one. Besides from the mentioned experimental issues, demand for a thinner ITO film still is not fulfilled. Reducing the thickness proportionally improves the transparency. However, deteriorates the electrical conductivity. Making between these two parameters compatible is a challenging job. Results reveal that optimized depositing power supply of 45W along with a vacuum heat treatment in 550℃ can improve the conductivity of 60nm ITO film to 3.3×〖10〗^(-4) (Ω-cm). Moreover, the great transparency of more than 90% in visible spectra region is also achieved thanks to the ultra-low thickness. In conclusion, to make a reproducible ITO thin film with a sputter coater designed for research objectives, operator faces lots of issues and challenges that have to be resolved. Experimental issues of target aging and its erosion can be solved using pre-sputtering and RF power supply, respectively and a challenge of keeping ultra-thin films of ITO a trustworthy transparent electrode also can be done using an optimized deposition and heat treatment conditions.

Item Type: Conference or Workshop Item (Paper)
Persian Title: Issue and Challenges Facing Sputtering of ITO thin films
Persian Abstract: -
Subjects: Divisions > Conferences > 1st International Conference on Optoelectronics, Applied Optics and Microelectronics - 2019
Conferences > 1st International Conference on Optoelectronics, Applied Optics and Microelectronics - 2019
Divisions: Conferences > 1st International Conference on Optoelectronics, Applied Optics and Microelectronics - 2019
Subjects > Conferences > 1st International Conference on Optoelectronics, Applied Optics and Microelectronics - 2019
Date Deposited: 08 Dec 2019 05:53
Last Modified: 08 Dec 2019 05:53
URI: http://repository.uma.ac.ir/id/eprint/10424

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